• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    A device (10, 30, 80) for ultrasonically cleaning a surface (65) on which a cleaning solution is disposed, wherein the device (10, 30, 80) comprises: at least one ultrasonic oscillator (1) configured for converting an electrical signal operating at a frequency of 50-60 Hz into electrical energy operating at a frequency comprised in the ultrasonic frequency band; at least one ultrasonic converter (2) for converting said electric energy into an ultrasonic mechanical vibration; at least one ultrasonic sonotrode band (4, 84, 84 ') coupled to said at least one ultrasonic converter (2) and configured to enter flexural resonance when said mechanical frequency vibration is applied to it and to elastically conform to said surface (65); said ultrasonic sonotrode band (4, 84, 84 ') being configured to, during use, generate a liquid coupling of cleaning solution between said ultrasonic sonotrode band (4, 84, 84') and said surface (65) and for exposing said surface (65) in contact with said liquid coupling of cleaning solution to cavitation, thereby removing dirt (70) from the surface (65). Ultrasonic cleaning method. (Machine-translation by Google Translate, not legally binding)
    公开号:ES2697917A1
    申请号:ES201730981
    申请日:2017-07-26
    公开日:2019-01-29
    发明作者:Miranda Jon Ander Sarasua；Verde Alejandro Sanda；Bengoetxea Manu Goiogana
    申请人:Fundacion Tekniker；
    IPC主号:
    专利说明:

    [0001]
    [0002]
    [0003]
    [0004] FIELD OF THE INVENTION
    [0005] The present invention belongs to the field of cleaning, both industrial and domestic. More specifically, the invention relates to methods and devices for ultrasonic cleaning.
    [0006]
    [0007] BACKGROUND OF THE INVENTION
    [0008] Ultrasonic cleaning is a process that uses ultrasound (generally between 20 and 200 kHz) and an appropriate liquid to clean items. Ultrasonic cleaners are used to clean many different types of objects, including optical parts, surgical instruments, tools, industrial parts and electronic equipment. Ultrasonic cleaning can be used for a wide range of shapes, sizes and materials of parts. In ultrasonic cleaning, the object to be cleaned is immersed in a metal tank containing a liquid solution (in an aqueous or organic solvent, depending on the application). An ultrasonic generator transducer incorporated in a chamber, or lowered in the liquid, produces ultrasonic waves in the liquid by changing the size in concert with an electrical signal that oscillates at the ultrasonic frequency. These elements normally form a resonant circuit. The electrical signal is produced by a high frequency electrical source. Ultrasonic cleaning uses cavitation bubbles induced by high frequency pressure (sound) waves to agitate the liquid. During cavitation, gas bubbles collapse with a large amount of energy, releasing strong shock waves. When bubbles implode near a surface, such as the surface to be cleaned, an asymmetric collapse can occur, releasing strong jets of water. Both phenomena contribute to eliminate dirt and accelerate chemical dissolution processes. In other words, agitation produces high forces in contaminants attached to substrates such as metals, plastics, gum, and ceramics. As an appropriate liquid, water or solvents can be used, depending on the type of contamination and the part. The use of an appropriate solvent for the article to be cleaned and the type of dirt present generally improves the cleaning effect. The Contaminants can include dust, dirt, oil, pigments, rust, grease, algae, fungi, bacteria, lime, polishing compounds, flow agents, fingerprints, soot wax and mold release agents, biological soil such as blood, etc.
    [0009]
    [0010] A major limitation of conventional ultrasonic cleaners is that the part to be cleaned needs to be completely submerged in the tank containing the liquid. Therefore, conventional ultrasonic cleaners are unviable for large parts or devices, or for non-removable structures, such as large-sized glass, construction fronts, floors, etc.
    [0011]
    [0012] JP H06 2183337 discloses a portable device for cleaning a piece by means of a sonotrode. The device does not require the complete immersion of the piece inside a tank that contains a cleaning solution. To clean the surface of the piece, a jet of water is projected through which ultrasonic waves are applied on the surface to be cleaned. In this device, the surface of the sonotrode designed to be closer to the surface to be cleaned is rigid and flat, whether vertical, inclined or ladder, with respect to the surface to be cleaned. This limits the effectiveness of the cleaning device when the surface to be cleaned is not homogeneous, for example when it is not completely smooth.
    [0013]
    [0014] On the other hand, methods of cleaning by pressurized water jets are known. However, these methods consume a very high amount of water and require a relatively high electrical power.
    [0015]
    [0016] Therefore, there is a need to develop a new ultrasonic cleaning device and method that overcomes the drawbacks of conventional devices and methods.
    [0017]
    [0018] DESCRIPTION OF THE INVENTION
    [0019]
    [0020] The present disclosure provides a new device and method of ultrasonic cleaning that does not require the immersion of the piece to be cleaned in a tank that contains a cleaning solution, and that is capable of cleaning pieces of irregular geometries. Based on the same principles of conventional ultrasonic cleaning, the proposed device and method manage to remove dirt from large surfaces, such as industrial parts, tiles, tiles, etc., both smooth and irregular (curved, rough, with volumetric patterns, etc.).
    [0021]
    [0022] In a first aspect of the present disclosure, a device for ultrasonically cleaning a surface on which a cleaning solution is disposed is provided. The device comprises: at least one ultrasonic oscillator configured to convert an electrical signal operating at a frequency of 50-60 Hz into electrical energy operating at a frequency comprised in the ultrasonic frequency band; at least one ultrasonic converter for converting said electric energy into an ultrasonic mechanical vibration; at least one ultrasonic sonotrode band coupled to said at least one ultrasonic converter and configured to enter flexural resonance when said mechanical frequency vibration is applied to the ultrasonic frequency and to elastically conform to said surface. The ultrasonic sonotrode band is configured to, during use, generate a liquid coupling of cleaning solution between said ultrasonic sonotrode band and said surface and to expose said surface in contact with said liquid coupling of cleaning solution to cavitation, thus eliminating the dirt on the surface.
    [0023]
    [0024] In embodiments of the invention, the ultrasonic sonotrode band is metallic.
    [0025]
    [0026] In embodiments of the invention, the ultrasonic sonotrode band has a thickness of less than 10 mm.
    [0027]
    [0028] In embodiments of the invention, the ultrasonic sonotrode band comprises a plurality of plastic drops in the portion intended to be closest to said surface to prevent friction between said ultrasonic sonotrode band and said surface.
    [0029]
    [0030] In embodiments of the invention, the device comprises two ultrasonic sonotrode bands configured to move on the surface to be cleaned, said two ultrasonic sonotrode bands being configured so that, in use of the device, the antinodes generated in each of them due to the flexural resonance are displaced in an ultrasonic sonotrode band with respect to the other ultrasonic sonotrode band.
    [0031]
    [0032] In embodiments of the invention, the device comprises two ultrasonic oscillators and two ultrasonic converters coupled to said at least one ultrasonic sonotrode band.
    [0033] In a second aspect of the present disclosure, there is provided a method of cleaning a surface by means of ultrasound, comprising: applying a cleaning solution on the surface to be cleaned; moving a device comprising at least one ultrasonic sonotrode band along said surface, said at least one ultrasonic sonotrode band pressing said surface; applying an ultrasonic vibration on said at least one ultrasonic sonotrode band; generating a liquid coupling of cleaning solution between said at least one ultrasonic sonotrode band and said surface; exposing to cavitation said surface in contact with said liquid coupling of cleaning solution, thus eliminating dirt from the surface.
    [0034]
    [0035] In embodiments of the invention, the generation of a liquid coupling of cleaning solution between said ultrasonic sonotrode band and said surface is achieved either by applying a drop of cleaning solution to both the cleaning solution disposed on the surface and the ultrasonic sonotrode band. ), or by lowering the ultrasonic sonotrode band until it comes in contact with a cleaning solution disposed on said surface.
    [0036]
    [0037] In embodiments of the invention, the device moves along said surface maintaining a constant distance between said surface and said ultrasonic sonotrode band.
    [0038]
    [0039] In embodiments of the invention, the cleaning solution is applied to the surface before the at least one ultrasonic sonotrode band is operated, so that a layer of cleaning solution is disposed on the surface.
    [0040]
    [0041] In embodiments of the invention, the cleaning solution is applied on the surface to be cleaned as the at least one ultrasonic sonotrode band moves along said surface, such that said liquid cleaning solution coupling is disposed between said surface and the outer surface of the ultrasonic sonotrode band.
    [0042]
    [0043] In embodiments of the invention, the cleaning solution is supplied externally to the ultrasonic sonotrode band by means of a syringe or an atomizing nozzle. In this case, the cleaning solution can be supplied internally to the ultrasonic sonotrode band along a channel disposed in the ultrasonic sonotrode band), said channel being designed to drive the solution cleaner to the surface of the ultrasonic sonotrode band closest to the surface to be cleaned.
    [0044]
    [0045] The cleaning solution can be reused by the ultrasonic sonotrode band by suction of dirty drops, the filtering of said dirty drops and the application of filtered drops while the ultrasonic sonotrode band advances on the surface to be cleaned.
    [0046]
    [0047] In embodiments of the invention, the cleaning solution is selected from the following group: water and aqueous solutions comprising at least one chemical agent.
    [0048]
    [0049] Advantages and additional features of the invention will be apparent from the detailed description that follows and will be pointed out in particular in the appended claims.
    [0050]
    [0051] BRIEF DESCRIPTION OF THE FIGURES
    [0052]
    [0053] To complement the description and in order to help a better understanding of the characteristics of the invention, according to an example of practical realization thereof, a set of figures is included as an integral part of the description, in which illustrative and not limiting, the following has been represented:
    [0054]
    [0055] Figure 1 shows a device for carrying out ultrasonic cleaning according to a possible embodiment of the invention.
    [0056]
    [0057] Figures 2 (a), 2 (b) and 2 (c) show the behavior of the water disposed on the surface to be cleaned, under different operating conditions, during the use of the device of the invention. In figure 2 (a) the band of the device has been represented without applying ultrasound. Figure 2 (b) shows the device operating with ultrasound in the cleaning mode. Figure 2 (c) shows the device operating with ultrasound in spray mode.
    [0058] Figure 3 illustrates an example of cleaning device prototype according to the embodiment shown in Figure 1.
    [0059]
    [0060] Figure 4 shows an ultrasonic cleaning device 30 according to a possible implementation of the invention.
    [0061] Figure 5 illustrates the flexural resonance that the band sonotrode of the device of the invention experiences, when the band vibrates at the operating frequency.
    [0062]
    [0063] Figure 6 illustrates the shape adopted by water droplets arranged on the band sonotrode when the band vibrates at bending resonance.
    [0064]
    [0065] Figures 7a and 7b show a detail of the cleaning device according to a possible implementation of the invention, in which the band sonotrode and the support on which it is fixed stand out.
    [0066]
    [0067] Figure 8 shows an alternative implementation of the cleaning device of the invention.
    [0068]
    [0069] Figure 9 schematizes the arrangement of antinodes in the two bands of the cleaning device of Figure 8.
    [0070]
    [0071] Figure 10 shows a cleaning device according to the invention, which is being displaced along the surface of a piece to be cleaned.
    [0072]
    [0073] Figure 11 illustrates a cleaning device during operation thereof in an ultrasonic cleaning method according to the present invention.
    [0074]
    [0075] Figure 12 shows a mirror subjected to cleaning tests with the device of the invention in a horizontal configuration, in which three zones are differentiated.
    [0076]
    [0077] Figure 13 shows a mirror subjected to cleaning tests with the device of the invention in vertical configuration, in which three zones are differentiated.
    [0078]
    [0079] Figure 14 illustrates a prototype cleaning device according to the invention, manually operated.
    [0080]
    [0081] DESCRIPTION OF A WAY TO CARRY OUT THE INVENTION
    [0082]
    [0083] In this text, the term "comprises" and its derivations (such as "understanding", etc.) should not be understood in an excluding sense, that is, these terms should not be interpreted as excluding the possibility that what is described and defined can include elements, additional stages, etc.
    [0084]
    [0085] In the context of the present invention, the term "approximately" and terms of its family (such as "approximate", etc.) should be interpreted as indicating very close to those who accompany the term. That is, a deviation within reasonable limits with respect to an exact value should be accepted, because one skilled in the art will understand that such deviation with respect to the indicated values may be unavoidable due to measurement inaccuracies, etc. The same applies to the terms "ones", "around" and "substantially".
    [0086]
    [0087] The description that follows should not be taken in a limited sense, but are provided solely for the purpose of describing broad principles of the invention. The following embodiments of the invention will be described by way of example, with reference to the figures cited above, which show apparatuses and results according to the invention.
    [0088]
    [0089] The device 10 illustrated in FIG. 1 represents a possible embodiment of a device for carrying out ultrasonic cleaning without having to immerse the piece to be cleaned 60 in a tank containing a cleaning solution. The piece to be cleaned can be a piece of large dimensions or of high weight. Non-limiting examples of such pieces are floors or pieces that make up a floor, walls or pieces that make up a wall, automotive parts, from the aerospace industry or from the energy sector, as energy concentrating mirrors. In the illustrated embodiment, the surface to be cleaned 65 of the piece 60 is shown as a substantially flat surface, but in general, the surface to be cleaned 65 can be of simple curvature, for example linear, cylindrical or parabolic (for example, a tube, bar or profile), or double-curved, for example car bodies, airplane wings or ship propellers. The surface to be cleaned 65 may have geometric irregularities, such as cavities, pores, periodic or non-periodic volumetric patterns, or any other irregularity. The surface to be cleaned 65 is cleaned by a sweeping motion, as explained below.
    [0090]
    [0091] In the illustrated implementation, the part 60 is a mirror. Ultrasonic cleaning without immersion is based on the generation of ultrasonic vibration in a thin layer of water (or cleaning solution, in general) deposited on the surface to be cleaned. This technique employs phenomena of reducing the surface tension of the cleaning agent (water or other), so that ultrasound can be applied directly on a film of water previously deposited on the surface to be cleaned 65. The cleaning device 10 should be swept or move along the surface to be cleaned 65. The water interface between the surface 65 and the part of the cleaning device 10 closest to said surface 65, is exposed to a very intense cavitation field.
    [0092]
    [0093] The device 10 comprises an ultrasonic wave generator 1 connected to a conventional voltage line (electrical network) 5. The voltage line 5 normally operates at 50-60 Hz, depending on the country. The ultrasonic generator 1 converts the standard electrical signal working at 50-60 Hz into electrical energy working at ultrasonic frequency, that is, above 20,000 cycles per second (20 KHz = 20,000 Hz) approx. In other words, the ultrasonic wave generator 1 generates high frequency (ultrasonic) electrical energy. The electrical energy provided by the ultrasonic wave generator 1 is converted into an ultrasonic converter (also called an ultrasonic transducer) 2 in mechanical vibration. It is a harmonic vibration whose frequency is the same as that generated by the wave generator 1. The amplitude of the vibration (maximum displacement) is related to the electrical power, and can be amplified mechanically by other components such as an intensifier 3 or a sonotrode 4. The specific characteristics of this mechanical vibration are given later in this description. The device 10 may optionally have an intensifier 3 (also called amplifier 3). An intensifier 3 is needed in applications that demand high power (ie, power greater than that provided by the ultrasonic wave generator 1). Therefore, in applications that require less power, the intensifier 3 can be removed. When present, the intensifier 3 is connected to the ultrasonic converter 2. The intensifier 3 amplifies the ultrasonic vibration from the ultrasonic converter 2 and transmits said amplified ultrasonic vibration to a sonotrode of band 4 (also sometimes referred to as "sonotrode band" or "band" in a simplified form in this text). The amplitude of the vibration applied on the band sonotrode 4 depends on the amplitude of the vibration provided by the converter 2 and the amplification provided by the intensifier 3, in case an intensifier is used. The intensifier 3 can also serve as a support means for the band 4 sonotrode.
    [0094]
    [0095] In the embodiment of Figure 1, the band horn 4 is connected to the intensifier 3 and receives the ultrasonic vibration of the intensifier 3. In the absence of an intensifier, the band horn 4 can be directly connected to the ultrasonic converter 2. In use of the device, the band or sonotrodo of band 4, due to its flexibility, it molds to the surface to be cleaned 65 (surface of piece 60) by pressing on it, as explained later. The band 4 sonotrode is implemented in a flexible material, which allows its adaptation to the surface to be cleaned. In embodiments of the invention, the band 4 sonotrode is metallic, given its ability to flex without breaking. Non-limiting examples of metals that can be used are aluminum, titanium and steel, among others. The band 4 is elongated and substantially flat. The thickness of the band 4 must be small enough so that the band is molded or adapted to the surface to be cleaned 65, but large enough so that the band does not break. In embodiments of the invention, the thickness of the band 4 is chosen to be less than 10 mm (millimeters), such as less than 5 mm or less than 3 mm. For example, a band 4 of thickness between 0.1 mm and 3 mm, such as between 0.5 mm and 3 mm, is chosen. Note that the surface to be cleaned 65 may have a certain curvature, irregularities, etc. In use of the device 10, the band 4 is pressed against the surface to be cleaned 65, so that the band 4 deforms, adapting to said surface to be cleaned 65. Depending on the material and thickness of the band 4, it can deform up to about 3 cm (centimeters), for example about 1 cm. An expert will understand that depending on the material used, which is outside the present invention, it is possible to produce bands with very low thicknesses while being sufficiently robust to fracture. So that when pressing the band 4 on the surface to be cleaned 65 it is not damaged (for example, scratched), and also so that the band 4 itself is not damaged, on the side of the band 4 configured to be closer to the surface to be cleaned 65 in use of the device 10, some drops of plastic, for example of silicone, spaced along the band 4, can be deposited so that these plastic drops or clusters are those that press against (or enter in). physical contact with) the surface to be cleaned 65, avoiding direct friction between the band 4 and the surface 65. Regarding the width and length of the band 4, these depend on the application for which the band 4 is designed. general lines, the applied power is distributed along the surface of the band 4. Therefore, the greater the length of the band, the greater the surface on which the applied power has to be distributed, so that the Cleaning is less intense. The same applies to the width of the band 4. Therefore, it is advisable, for each application, to look for the width and maximum length that guarantee that against a certain ultrasound power, the type of dirt present on the surface in question will be cleaned.
    [0096] The band sonotrode 4 receives the ultrasonic vibration of the intensifier 3 (or of the ultrasonic converter 2, as the case may be), and transmits said ultrasonic vibration to the liquid disposed on the surface to be cleaned 65. The inventors have observed that, surprisingly, the vibration ultrasonic of the band sonotrode 4, on coming into contact with the liquid disposed on the surface to be cleaned 65, causes the liquid to cavitate at high frequency, thus eliminating dirt from the surface 65 of the piece 60 on which the liquid. The ultrasonic vibration that is applied to the ultrasonic sonotrode 4 are transverse waves in a direction perpendicular to the band of the band sonotrode 4. Figure 5, which is described below, represents the ultrasonic vibration applied to the band sonotrode 4.
    [0097]
    [0098] To clean the surface 65, there must be a liquid coupling between the surface 65 and the surface of the band 4 sonotrode. It is well known that ultrasonic vibration reduces the surface tension of the liquids, which increases the contact surface between the liquid ( cleaning solution) and the solid (band 4 sonotrode and surface 65). If the contact surface increases, the liquid interface (liquid coupling) can retain a larger volume of liquid. The more amplitude of vibration we have, the more contact surface we will have and, therefore, a larger volume of cleaning solution will be retained. In order to collect as much liquid volume as possible between the surface of the band sonotrode 4 and the surface 65 to be cleaned, it is desired that the surface of the band 4 sonotrode be as wide as possible, taking into account the requirement of power mentioned above. The elongated surface of the band 4 sonotrode, along which the ultrasonic vibration is transmitted, provides an adequate contact surface with the liquid.
    [0099]
    [0100] For a given frequency, depending on the liquid to be disposed between the surface of the band sonotrode and the surface to be cleaned 65, there is a critical threshold value, in which the amplitude of the vibration is so high that the liquid coupling becomes unstable and becomes unstable. atomize. This threshold depends on the physical properties of the liquid. In particular, it depends on the density of the liquid, the viscosity and the surface stress. For example, in case the cleaning solution is tap water, and given a frequency of 20 kHz, this critical threshold is 11 pm. In another example, in the case of acetone (cleaning solution), and given a frequency of 20 kHz, this critical threshold is less than 3 pm. The amplitude of vibration above which the liquid coupling is atomized also depends on the applied frequency. In particular, the critical threshold (threshold above which the liquid coupling is atomized) decreases with the square frequency. For example, if the frequency varies from 20 kHz to 40 kHz (ie, x2), the vibration amplitude threshold is divided by 22. In general, if the frequency is multiplied by N (xN), the amplitude threshold of vibration is divided by 2N
    [0101]
    [0102] These phenomena are illustrated in figures 2 (ac). Figure 2 (a) shows a situation in which ultrasound (US) is not applied by a band 4 sonotrode to the liquid layer (cleaning solution) disposed thereunder. In this case, conventional liquid drops can adhere to the output surface of the band 4 sonotrode. Figure 2 (b) shows a situation in which the band 4 sonotrode (and the ultrasonic vibration it produces) has succeeded in reducing the Stress on the liquid below without atomizing it. When this occurs, the liquid tends to adhere to the output surface of the band 4 sonotrode (in other words, the liquid is attracted to the output surface of the band 4 sonotrode), generating a large homogeneous linear liquid coupling 20 (also referred to as static liquid coupling 20). The larger the output surface of the band 4 sonotrode, the more liquid will form the static liquid coupling 20. Any physical object that comes into contact with this liquid coupling 20 will be exposed to a very intensive cavitation and, therefore, cleaned . If there is a relative movement (such as a sweeping motion) between the liquid coupling 20 and the dirty porous object, the liquid coupling 20 will lose some of its contents, which will remain within the pores. To avoid this problem, the porous surface to be cleaned must be previously wet. Finally, Figure 2 (c) shows a situation in which the ultrasonic vibration produced by the band horn 4 has atomized the liquid disposed below the outlet surface of the sonotrode. Therefore, the dirty surface is not cleaned. In the examples of FIGS. 2 (ac), the liquid is tap water. As already mentioned, the critical threshold of the vibration amplitude applied by the output surface of the band sonotrode to which the tap water does not atomize is 11 pm given a frequency of 20 kHz. That is why the desired effect (Figure 2 (b)) occurs when said vibration amplitude is equal to or less than 11 pm, while the undesired effect (Figure 2 (c)) occurs when said amplitude of vibration is greater than 11 p.m.
    [0103] As already explained, the inventors have observed that the amplitude of vibration applied on the surface of the band 4 sonotrode is very important, since for each cleaning solution that can be used, there is a critical threshold or maximum value of this amplitude of vibration, so that if the amplitude of applied vibration exceeds the threshold associated with each cleaning solution, the cleaning solution will atomize (FIG. 2 (c)) instead of forming a homogeneous linear liquid coupling 20 or a static liquid coupling 20 (FIG. 2b)). The converter 2 has a nominal electric power that ensures a given vibration amplitude.
    [0104]
    [0105] That is, given a certain cleaning solution (which has specific physical properties) and given a certain frequency, there is a vibration amplitude threshold above which the ultrasonic vibration produced by the band 4 sonotrode in its output produces the atomization of the liquid arranged below the band sonotrode. Consequently, the dirty surface 65 is not cleaned. On the other hand, it is advisable to work with an amplitude of vibration close to (but lower) said threshold, because if the amplitude of vibration is much lower than the threshold, the cleaning capacity will be reduced.
    [0106]
    [0107] When the surface to be cleaned 65 has geometric irregularities, such as ornamental patterns in volume or simple faults or errors, in order to clean it adequately, the height or depth of the irregularity or cavity defined by the volumetric pattern, is preferably smaller than the height of the volume of retained liquid (liquid coupling 20), as shown for example in Figure 2 (b).
    [0108] Figure 3 illustrates an example of a cleaning device prototype 10 according to the embodiment shown in figure 1. In the prototype, the signal generator 1, the ultrasonic converter (also called a piezoelectric converter or ultrasonic transducer) 2, can be seen. intensifier 3 and the band or band sonotrode 4. In addition, it is also possible to observe the plug 5 through which the device 10 can be fed.
    [0109]
    [0110] Figure 4 shows an ultrasonic cleaning device 30 according to a possible implementation of the invention. In addition, the mode of operation thereof is illustrated. On this occasion, the device 30 is formed by two sets of intensifier 3 and converter 2. The two sets provide the ultrasonic vibration to the same band or sonotrode of band 4. Depending on the power needed to cleaning the surface 65 of the piece to be cleaned, which in turn may depend on the amount of accumulated dirt, on the irregularities of the surface 65 and / or on the surface size to be cleaned, one, two or more intensifier assemblies may be used 3 and converter 2 associated with the same band horn 4. In FIG. 4, the arrow represents the direction of sweep or slide of the assembly on the surface 65 during the use of the device 30. In the figure there are also illustrated means of clamping or support 6, such as clamps or other, to hold the one or more sets of intensifier 3 and converter 2 and facilitate their sweep on the surface to be cleaned 65.
    [0111]
    [0112] By vibrating band 4 at the operating frequency (around 20 KHz (20,000 Hertz)), the band enters flexural resonance, as illustrated in figure 5. This resonance can produce a deformation between peaks of, for example, several microns (10-6 meters) As can be seen, when flexing resonance, the band 4 presents a plurality of antinodes (wave peaks) 51 that act as vibration emitters. supporting the band 4 on the wet surface to be cleaned 65, the band of the sonotrode is elastically deformed and takes the form of the surface 65. The antinodes 51 correspond to the zones of the band 4 in which higher power ultrasonic vibration is emitted. Referring now, for example, to Figure 4, in which the operation of the device 30, which is swept along the surface to be cleaned 65, is schematized, it has been observed that by applying a certain power, the surface to be cleaned 65 is cleaned c orrectamente in the zones of the surface 65 corresponding to the antinodos 51 of the band 4, whereas the zones of the surface 65 corresponding to zones of the band different from the antinodos, remain relatively dirty. That is, it has been observed that the device 10, 30 cleans especially efficiently in the vicinity of the antinodes 51. Accordingly, the surface to be cleaned 65 can alternate clean areas with dirty areas, clean areas corresponding to where the band 4 has presented antinodes 51. It has been observed that by increasing the nominal power applied, so that the power in the antinodes 51 is greater than that necessary to clean the area of the surface 65 corresponding to the antinodes, the band 4 also cleans in the zones of the surface that do not correspond to the antinodes formed in the band 4. That is, by varying the power provided to the sonotrode of band 4, it is possible to achieve that the antinodes 51 provide sufficient vibration power for cleaning the areas of the surface to be cleaned 65 furthest from the antinodes 51. Figure 6 shows the waves formed by water deposited on a band 4 when the band 4 vibrates in bending resonance. The effect of antinodes 51 (power peaks) is appreciated.
    [0113]
    [0114] Figures 7a and 7b illustrate a detail of the cleaning device according to a possible implementation thereof, in which the sonotrode of band 4 and the support 6 on which it is fixed stands out. The band (band sonotrode) 4 is arranged in or coupled to a fastening means or support 6. The fastening means or support 6 are elongated, so that the band 4 is fastened thereto along its length (dimension higher). In figure 7a, the fastening means 6 is observed in the foreground, while figure 7b corresponds to a rotated view of figure 7a, in which the strip 4 is better appreciated. In figure 7a part of a converter 2 is observed (there may be more than one associated with the same band, as previously indicated). The device also has a system or mechanism for distributing water 7 (or cleaning liquid, in general), formed in this case by small pipes that deliver said liquid to a plurality of nozzles 8 through which the liquid is expelled in use of the device. The liquid may reach the distribution system or mechanism 7 from a reservoir (not shown). Figures 7a and 7b also show some bearings 9 and wheels 11, both optional, which contribute to facilitate the displacement or sweeping of the device on the surface to be cleaned. Figure 14 shows a prototype cleaning device incorporating the details of figures 7a and 7b, manually operated by a crank 12.
    [0115]
    [0116] Figure 8 shows an alternative implementation of the device 80 of the invention. As explained in connection with FIGS. 5 and 6, the band 4 sonotrode cleans especially efficiently on the surface 65 of the part on which it is barreled corresponds to the anti-nodes 51. Therefore, depending on the dirt , of the type of piece to be cleaned (for example very rough pieces or with deep cavities), of the power that is going to be used and / or of the speed at which the sweep is going to be carried out, it may be advisable to use a second band parallel to the first band of the device. This is illustrated in Figure 8. In it, a first set of intensifier 3 and converter 2 provide ultrasonic vibration to a first band horn 84, while a second set of intensifier 3 and converter 2 provide ultrasonic vibration to a second band sonotrode 84 ', which slides or sweeps the surface to be cleaned immediately behind the first band horn 84. By designing the two bands 84, 84' (and corresponding intensifier and converter assemblies) so that the Antinodos 51 of each band occur displaced from each other, as schematic figure 9, it is possible to clean all the areas of the surface 65 of the piece. In Figure 9, the antinodes 51 of each band 84, 84 'have been schematized as circles. The complete cleaning of the surface 65 is thereby achieved by alternately cleaning with one or other band sonotrode 84, 84 '.
    [0117]
    [0118] The use of the one-piece ultrasonic cleaning device 10, 30, 80 is as follows: The device 10, 30, 80 is swept along the surface 65 of the piece 60 to be cleaned, as illustrated in Fig. 10. Figure 10 shows the device 10 of figure 1, but equally the device 30 or the device 80 could have been represented, since the use thereof is similar. This operation can be performed either manually or by automatic devices, such as robotic manipulators. To prevent damage (such as scratching) on the surface to be cleaned, as well as on the band horn 4, physical contact between the surface 65 and the band horn 4 should preferably be avoided. As explained, said direct contact is avoided, for example, by applying a few drops of a plastic material, for example silicone, on several points of the band 4 (of its part destined to approach intimately to the surface to be cleaned), so that these drops are those that press on the surface to be cleaned, avoiding friction between the band 4 and the surface to be cleaned.
    [0119]
    [0120] In addition, the device 10, 30, 80 preferably includes mechanical means, such as wheels 11, as illustrated for example in figures 7a and 7b, to maintain a certain space between the band sonotrode 4 and the cleaning solution disposed on the surface 65 to clean. Such mechanical means are especially recommended during manual sweeping movement. Figure 11, which will be described in detail below, shows the sweep distance D between the band sonotrode 4 and the surface 65 to be cleaned, when sweeping the device 10. The maximum distance Dmax to the surface 65, to which it can sweep the band 4 sonotrode, it is determined by the largest liquid coupling obtainable from cleaning solution. Therefore, the maximum distance Dmax is determined by the maximum volume (amount) of liquid that can be retained between the strip sonotrode 4 and the surface. In other words, depends on the size (height) of the static liquid coupling. If the distance D is above the maximum value Dmax, there is no longer any contact between the liquid coupling contained between the band sonotrode 4 and the wet surface 65 and therefore the static liquid coupling is broken. This maximum volume of liquid retained depends on the type of cleaning solution (which has specific physical properties) and the material of the band sonotrode 4. In embodiments of the invention, a distance D of about 3 mm is chosen so as not to work under limit conditions. In other embodiments of the invention, a distance D of between 1 and 3 mm, inclusive, is chosen. This distance D is given by the height of the plastic stop (for example, silicone), applied at different points of the band 4 sonotrode to avoid direct contact of the band sonotrode with the surface to be cleaned. That is, since when sweeping the band horn 4 on the surface 65 to be cleaned, pressure is applied to bring the band close to the surface 65, plastic buffers or drops are previously deposited on the band, these bumps or drops having a height D.
    [0121]
    [0122] In addition to the dirt present on the surface to be cleaned and the power applied by the cleaning device, it has been observed that two parameters that affect cleaning are this distance D and the speed at which the device moves or sweeps on the surface to clean.
    [0123]
    [0124] With reference to Figure 10 or 11, between the surface 65 of the piece 60 and the band of the sonotrode 4, a layer of liquid or liquid film (cleaning solution) is applied (not visible in Figure 10). The ultrasonic vibration applied by the band 4 sonotrode causes the cleaning solution to cavitate, releasing strong shock waves and water jets on the surface 65. Both the shock waves and the water jets remove the dirt particles (sand, dirt, dust, mud ...) and accelerate solutions (paint, oil, grease ...). The cavitation can penetrate into pores, cracks, cavities or any other pattern present on the surface to be cleaned. In other words, the ultrasonic cavitation power is concentrated in a thin layer of liquid (cleaning solution) when the band 4 sonotrode applies ultrasonic vibration to the cleaning solution. Non-limiting examples of cleaning solutions that can be used are water (such as tap water) and aqueous solutions comprising chemical agents, such as soap, acetone and alcohol. The distance D between the band sonotrode 4 closest to the surface 65 to be cleaned is preferably greater than the thickness of the cleaning solution layer. That is, the The outlet surface of the sonotrode 4 preferably is not in direct contact with the cleaning solution. This distance D, illustrated in FIG. 11, between the outlet surface of the strip sonotrode 4 and the surface 65 to be cleaned, preferably remains constant throughout the scanning process, such as by means of the plastic droplets arranged on the sonotrode 4 of band that avoid the direct contact between the sonotrode of band 4 and the surface to be cleaned 65.
    [0125]
    [0126] The application of a cleaning solution to the surface 65 to be cleaned can be done in different ways. In a particular embodiment, before moving or sweeping the band horn 4 on the surface 65 to be cleaned, a layer of cleaning solution is applied on that surface, such that substantially all of the surface 65 to be cleaned is covered with a layer of liquid. To work in this way, an initial impulse is necessary (for example a single drop of liquid to obtain liquid coupling). If ultrasonic vibration is activated, when the drop touches both the liquid layer and the band sonotrode, a static liquid coupling will be generated. It does not matter that there is relative movement between the band horn and the liquid layer because the surface tension of the liquid coupling is so low that it tends to "stick" to both elements. In other words, once the liquid coupling is formed, the scanning movement of the band sonotrode can be produced. In another embodiment, a liquid coupling is generated by downward movement of the band sonotrode until it comes into contact with the liquid layer. In other words, an initial contact is required (water on the surface to be cleaned and water in the band).
    [0127]
    [0128] As already mentioned, the band horn 4 (in fact, the entire device 10, 30, 80) moves on the surface 65, sweeping the surface from a first end 65a to the opposite end 65b, along the length of the surface 65 to be cleaned, as shown in figure 10. If the surface to be cleaned is wider than the width of the band (or bands) of the sonotrode, it will be necessary to sweep the device 10, 30, 80 throughout of the surface 65 as many times as necessary so that the sonotrode of band 4 applies an ultrasonic vibration on the water disposed on the entire surface to be cleaned. Depending on the application and size of the surface to be cleaned, a cleaning device can be designed whose strip 4 is as long as required so as not to have to sweep several times along the surface to be cleaned.
    [0129] In another particular embodiment, a layer of cleaning solution covering the entire surface to be cleaned is not applied before sweeping the band sonotrode 4 on the surface 65 to be cleaned. In contrast, the aforementioned liquid coupling is constantly regenerated. In this embodiment, a cleaning solution can be provided externally to the band sonotrode 4, for example by means of a syringe or spray nozzle, as illustrated in the embodiment shown in Figures 7a and 7b. Alternatively, the cleaning solution can be provided internally to the band 4 sonotrode, for example along a channel disposed within the band sonotrode, designed to bring water to the surface of the band 4 sonotrode, designed to be closer to the surface to clean.
    [0130]
    [0131] Figure 11 illustrates the operation of a device 10 for ultrasonic cleaning according to the invention. The ultrasonic wave generator and the intensifier are not shown in figure 11. The part 60 to be cleaned is also shown. In Figure 11, the arrow M represents the sweeping movement of the device 10. The surface 65 of the piece 60 to be cleaned is cleaned while the device 10 moves forward. The dirt 70 is shown on the surface 65 not yet cleaned. Figure 11 relates to an embodiment in which there is no layer of cleaning solution disposed on the surface 65 to be cleaned prior to the movement of the band horn 4. Instead, a cleaning solution is provided to the surface 65 when the band 4 sonotrode moves forward. The arrow A1 represents the direction of the droplets 80 of cleaning solution supplied while the device 100 moves. When the droplets of cleaning solution 80 come into contact with the band sonotrode 4, ultrasonic vibration V is produced, as a result of which dirt is removed from the surface 65 of the piece 60. The arrow A2 represents the direction of the droplets dirty 71 being sucked by an external vacuum device while the band 4 sonotrode is advancing. In a particular embodiment, in which the cleaning solution is water, the dirty water 71 can be filtered in the device 10, which continuously provides filtered water 80, thereby reusing the water. The same system could be used for any type of cleaning solution. In this case, the arrow A3 represents schematically the direction of the dirty water (or cleaning solution, in general), which is filtered to be reused. In a particular embodiment, the dirty water 71 is fed back and filtered by means of a hydraulic system including particle filtration (not shown). In other words, in this realization, the water layer is constantly regenerated thanks to filtration media. In this way, the only water consumed by the device 10 is the water that remains on the clean surface, for example in the pores, if any, arranged on the surface 65 of the piece 60. The water consumption is very low ( only the amount necessary to moisten the surface 65 to be cleaned).
    [0132]
    [0133] The device of the invention, and in particular the band or band sonotrode, can be arranged in different configurations, such as horizontal, vertical or oblique. In any of them the device can be operated manually by an operator or in an automated (for example, robotic).
    [0134]
    [0135] Various cleaning tests have been performed with the device of the invention at an operating frequency of the 40 KHz ultrasonic converter, which provides vibration with an amplitude of 10 microns (10 ^ m = 10 x 10-6 m) at its nominal power ( 200W). It has been used a cleaning device of a single sonotrode band, aluminum, with a single converter. The surface to be cleaned chosen for the tests has been a mirror of those used as solar energy concentrators. The mirrors were manually soiled with water and dust and dried. By activating the vibration and pouring water on the sonotrode band, a linear liquid coupling is generated. The cleaning device has been swept on the surface to be cleaned at a substantially constant distance D = 1mm, determined by the height of the same value of a few drops of silicone deposited on the surface of the band closest to the surface to be cleaned. When the liquid coupling comes in contact with the dirty surface, it cleans it deeply. The device has been moved on the surface to be cleaned at speeds that vary between 1 and 10 meters / minute. The results have been compared with respect to cleaning by high pressure water. Tests have been carried out both with the mirror arranged horizontally (0 degrees), oblique (at 45 degrees) and vertical (90 degrees). The water supply has been made by a manual atomizer. Figure 12 shows a mirror used in the tests in a horizontal configuration, in which three zones are differentiated. The sweep has occurred from left to right in the illustrated mirror. The converter of the device was arranged in the upper part of the image (that is, in the initial position, approximately in the upper left corner of the mirror), so that as it was swept from left to right, the converter was close to the bottom part (top of the image) of the mirror, while the bottom or next of the mirror was swept by the part of the band furthest from the converter. The first zone (zone 1) has therefore been cleaned in the area near the converter. This zone 1 shows a homogeneous cleaning. It has been proven that its relative reflectivity is greater than 99%. The second zone (zone 2) is farther from the converter, so the amplitude is smaller. This zone 2 shows a band cleaning, so that the clean zones correspond to the antinodes of the sonotrode band, while the dirty zones correspond to zones of the band where there were no antinodes. That is, in this case, the amplitude necessary to clean homogeneously is only obtained near the converter. As can be seen in zone 1, when the amplitude of vibration exceeds a certain threshold, the bands that are seen in zone 2 disappear, achieving homogeneous cleaning. There is therefore a window of amplitude with a minimum value to avoid the appearance of bands, and a maximum to avoid atomization of the liquid. It has been found that inhomogeneous cleaning of zone 2 is solved either by increasing the nominal power applied, to minimize the impact of the distance of the converter to the farthest end of the band, or by including a second converter, as illustrated by example in figure 4. The third zone (zone 3) is an untreated zone (totally dirty). Figure 13 shows a mirror used in the tests in a vertical configuration, in which three zones similar to those of figure 12 are differentiated. The relative reflectivity of the first zone (zone 1) is also greater than 99%.
    [0136]
    [0137] In conclusion, in the area of the antinodes, that is, in the areas where the sonotrode band is closest to the surface to be cleaned, molding to it, the cleaning power is so high that the cleaning is very efficient. It has also been observed that the orientation of the device does not affect the quality of the results. However, in the horizontal configuration water droplets must be removed after cleaning, while in the vertical the water supply is somewhat more complicated.
    [0138]
    [0139] Another experiment has been carried out, in which a similar mirror has been cleaned working at a frequency of 30 KHz with a higher power converter (1200W). Due to generator limitations, the rated power is limited to 400W. At 100% of the chosen nominal power, ie 400 W (watts), no dirt bands have been observed between the clean areas; in addition, its relative reflectivity is greater than 99%. However, working at 10% of the chosen nominal power, ie 40 W, dirty bands have been observed between clean areas of the mirror (the clean zones correspond to the antinodes of the sonotrode band). Compared with a conventional high pressure cleaning system of 200 bar, it is not able to clean the mirror correctly and the water consumption is 15 liters / minute, that is 600 times higher than the consumption using the device of the invention.
    [0140]
    [0141] In conclusion, the proposed device and method allow to clean pieces of any size using ultrasonic techniques, without submerging the piece in a tank full of water. The method and the device are indicated for the ultrasonic cleaning of pieces having substantially planar surfaces, or simple curved surfaces, or double curved surfaces, or surfaces having geometrical irregularities or volumetric patterns, such as cracks, cavities, pores or patterns. Non-limiting examples of the applications of the invention are the cleaning of walls that have graffiti, cleaning of bricks or tiles or cleaning of parts of industrial sectors, such as automotive, aerospace or energy. Among the advantages of the invention, no physical contact between the band sonotrode and the piece to be cleaned is required. Because the band sonotrode adapts to the surface to be cleaned, optimal cleaning is achieved without damaging the sonotrode piece or band. In addition, the layer of cleaning solution used can be filtered and constantly reused. In fact, on impervious surfaces, such as glass or metal, when a static liquid layer is generated, the liquid consumption is almost zero because it can be constantly filtered and reused. The ultrasound waves penetrate into small pores, cracks or cavities of the surface to be cleaned. It can be used with only water or with an aqueous solution comprising chemical agents. In this last case, the ultrasonic cavitation drastically accelerates the chemical reactions, dissolving the dirt adhered to the surface to be cleaned. The method and the device can be applied both for industrial tasks and for domestic cleaning tasks.
    [0142]
    [0143] On the other hand, with respect to other conventional cleaning methods, such as by pressurized water jets, the device of the present invention consumes up to 600 times less water, while requiring an electric power an order of magnitude less.
    [0144]
    [0145] The invention is obviously not limited to the specific embodiment (s) described (s), but also encompasses any variation that may be considered by any expert in the art (e.g., in relation to the choice of materials, dimensions, components, configuration, etc.), within the general scope of the invention as defined in the claims.
    权利要求:
    Claims (15)
    [1]
    1. - A device (10, 30, 80) for ultrasonically cleaning a surface (65) on which a cleaning solution has been arranged, wherein the device (10, 30, 80) comprises:
    - at least one ultrasonic oscillator (1) configured to convert an electrical signal operating at a frequency of 50-60 Hz into electrical energy operating at a frequency comprised in the ultrasonic frequency band;
    - at least one ultrasonic converter (2) for converting said electric energy into an ultrasonic mechanical vibration;
    - at least one ultrasonic sonotrode band (4, 84, 84 ') coupled to said at least one ultrasonic converter (2) and configured to enter bending resonance when said ultrasonic frequency mechanical vibration is applied to it and to elastically conform to said surface (65);
    said ultrasonic sonotrode band (4, 84, 84 ') being configured to, during use, generate a liquid coupling of cleaning solution between said ultrasonic sonotrode band (4, 84, 84') and said surface (65) and for exposing said surface (65) in contact with said liquid coupling of cleaning solution to cavitation, thereby removing dirt (70) from the surface (65).
    [2]
    2. The device (10, 30, 80) of claim 1, wherein said ultrasonic sonotrode band (4, 84, 84 ') is metallic.
    [3]
    3. The device (10, 30, 80) of any of the preceding claims, wherein said ultrasonic sonotrode band (4, 84, 84 ') has a thickness of less than 10 mm.
    [4]
    4. - The device (10, 30, 80) of any of the preceding claims, wherein said ultrasonic sonotrode band (4, 84, 84 ') comprises a plurality of plastic drops in the part intended to be closest to said surface (65) to prevent friction between said ultrasonic sonotrode band (4, 84, 84 ') and said surface (65).
    [5]
    5. The device (80) of any of the preceding claims, comprising two ultrasonic sonotrode bands (84, 84 ') configured to move on the surface to be cleaned (65), said two ultrasonic sonotrode strips (84, 84 ') configured so that, in use of the device, the antinodes (51) generated in each of them due to the flexural resonance are displaced in an ultrasonic sonotrode band (84) with respect to the other ultrasonic sonotrode band (84 ').
    [6]
    6. - The device (80) of any of the preceding claims, comprising two ultrasonic oscillators (1) and two ultrasonic converters (2) coupled to said at least one ultrasonic sonotrode band (4, 84, 84 ').
    [7]
    7. - A method of cleaning a surface (65) by ultrasound, comprising:
    -apply a cleaning solution on the surface to be cleaned (65);
    - moving (M) a device (10, 30, 80) comprising at least one ultrasonic sonotrode band (4, 84, 84 ') along said surface (65), pressing said at least one ultrasonic sonotrode band (4, 84, 84 ') on said surface (65);
    - applying an ultrasonic vibration (V) on said at least one ultrasonic sonotrode band (4, 84, 84 ');
    - generating a liquid coupling (20) of cleaning solution between said at least one ultrasonic sonotrode band (4, 84, 84 ') and said surface (65);
    exposing said surface (65) to cavitation in contact with said liquid cleaning solution coupling, thus removing dirt (70) from the surface (65).
    [8]
    8. - The method of claim 7, wherein said generation of a liquid coupling of cleaning solution between said ultrasonic sonotrode band (4, 84, 84 ') and said surface (65) is achieved by applying a drop of cleaning solution both the cleaning solution disposed on the surface (65) and the ultrasonic sonotrode band (4, 84, 84 '), or by lowering the ultrasonic sonotrode band (4, 84, 84') until it comes into contact with the ultrasonic sonotrode band (4, 84, 84 '). a cleaning solution disposed on said surface (65).
    [9]
    9. - The method of any of claims 7 or 8, wherein the device (10, 30, 80) moves along said surface (65) maintaining a constant distance (D) between said surface (65) and said ultrasonic sonotrode band (4, 84, 84 ').
    [10]
    10. - The method of any of claims 7 to 9, wherein said cleansing solution is applied on the surface (65) before the at least one ultrasonic sonotrode band (4, 84, 84 ') starts to function, that a layer of cleaning solution is disposed on the surface (65).
    [11]
    11. - The method of any of claims 7 to 9, wherein said cleaning solution is applied on the surface (65) to be cleaned as the at least one ultrasonic sonotrode band (4, 84, 84 ') is moved to along said surface (65), so that said liquid cleaning solution coupling is disposed between said surface (65) and the outer surface of the ultrasonic sonotrode band (4, 84, 84 ').
    [12]
    12. - The method of claim 11, wherein said cleaning solution is supplied externally to the ultrasonic sonotrode band (4, 84, 84 ') by means of a syringe or an atomizing nozzle (8).
    [13]
    13. - The method of claim 11, wherein said cleaning solution is supplied internally to the ultrasonic sonotrode band (4, 84, 84 ') along a channel (7) disposed in the ultrasonic sonotrode band (4, 84, 84 '), said channel (7) being designed to drive the cleaning solution to the surface of the ultrasonic sonotrode band (4, 84, 84') closest to the surface (65) to be cleaned.
    [14]
    14. - The method of any of claims 11 to 13, wherein said cleaning solution is reused by the ultrasonic sonotrode band (4, 84, 84 ') by suction (A2) of dirty drops (71), filtrate ( A3) of said dirty drops and the application (A1) of filtered drops (80) while the ultrasonic sonotrode band (4, 84, 84 ') advances on the surface (65) to be cleaned.
    [15]
    15. - The method of any of claims 7 to 14, wherein said cleaning solution is selected from the following group: water and aqueous solutions comprising at least one chemical agent.
    类似技术:
    公开号 | 公开日 | 专利标题
    TWI467642B|2015-01-01|Megasonic precision cleaning of semiconductor process equipment components and parts
    JP4442383B2|2010-03-31|Ultrasonic cleaning equipment
    CN103229279B|2015-11-25|Ultrasonic cleaning equipment and method for suppersonic cleaning
    JPWO2010101036A1|2012-09-06|Ultrasonic cleaning method and ultrasonic cleaning apparatus
    JP2006347000A|2006-12-28|Liquid droplet delivering device with cleaning function and method of cleaning liquid droplet delivering device
    JP5100358B2|2012-12-19|Filter cleaning device and filter cleaning method
    ES2697917B2|2020-05-04|DEVICE AND METHOD OF ULTRASONIC CLEANING
    ES2209077T3|2004-06-16|CLEANING PROCEDURE OF A METAL PART.
    KR100800174B1|2008-02-01|Wafer cleaning module using megasonic
    CN107262452B|2019-04-09|A kind of chemical experiment test tube cleaning device
    JP4449643B2|2010-04-14|How to clean plastic lenses
    JP2009202156A|2009-09-10|Cleaning apparatus
    JP4874395B2|2012-02-15|Cleaning device using ultrasonic waves
    ES2708149B2|2021-05-14|Method and device for ultrasonic cleaning
    JP2007294822A|2007-11-08|Apparatus and method for ultrasonic cleaning
    KR101639635B1|2016-07-25|Method of megasonic cleaning and apparatus of cleaning
    CN104646324B|2017-01-18|Acoustic vibration brush and cleaning method adopting acoustic vibration brush
    JP2012200611A|2012-10-22|Apparatus of cleaning optical component
    CN204523614U|2015-08-05|A kind of acoustic vibration brush
    JP2014131033A|2014-07-10|Method and device for processing wafer shape article
    JP5517227B2|2014-06-11|Ultrasonic precision cleaning equipment
    JP2005103466A|2005-04-21|Ultrasonic cleaner
    JP3871748B2|2007-01-24|Electrode plate cleaning method for plasma processing apparatus
    JP2004033914A|2004-02-05|Ultrasonic cleaner
    KR20200036151A|2020-04-07|Substrate cleaning apparatus and substrate cleaning method
    同族专利:
    公开号 | 公开日
    WO2019020857A1|2019-01-31|
    ES2697917B2|2020-05-04|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    ES2227806T3|1997-02-10|2005-04-01|Dr. Hielscher Gmbh|PROCEDURE AND DEVICE FOR CLEANING IN THE FORM OF THREAD OR BAND, ABOVE ALL, WIRE.|
    WO2001036118A1|1999-11-16|2001-05-25|The Procter & Gamble Company|Ultrasonic cleaning|
    US20030101532A1|1999-12-16|2003-06-05|Kai Desinger|Wall and floor cavitation cleaner|
    US20040250843A1|2001-10-31|2004-12-16|Holger Hielscher|Ultrasonic cleaning system for cleaning a plurality of parallel extending, strand like products, such as example wires, profiles and pipes|
    EP1681383A1|2005-01-14|2006-07-19|Electrolux Home Products Corporation N.V.|Textile product treating apparatus having an ultrasonic cleaning device|
    FR2549745B1|1983-07-27|1986-10-10|Scp Biscornet|METHOD FOR ULTRA-SOUND CLEANING OF SURFACES AND DEVICE AND INSTALLATION IMPLEMENTING THE METHOD|
    DE4012467C2|1990-04-19|1992-07-23|D.T.I. Dr. Trippe Ingenieurgesellschaft Mbh|
    JPH06218337A|1993-01-25|1994-08-09|Kaijo Corp|Ultrasonic cleaning machine|
    FR3026323B1|2014-09-26|2016-12-09|Commissariat Energie Atomique|SYSTEM AND METHOD FOR ULTRASONIC CLEANING OF A SURROUNDED SURFACE COMPRISING A ULTRASONIC WAVE GENERATING DEVICE|US11228276B1|2021-07-27|2022-01-18|King Abdulaziz University|Ultrasound cleaning system for solar panels|
    法律状态:
    2019-01-29| BA2A| Patent application published|Ref document number: 2697917 Country of ref document: ES Kind code of ref document: A1 Effective date: 20190129 |
    2020-05-04| FG2A| Definitive protection|Ref document number: 2697917 Country of ref document: ES Kind code of ref document: B2 Effective date: 20200504 |
    优先权:
    申请号 | 申请日 | 专利标题
    ES201730981A|ES2697917B2|2017-07-26|2017-07-26|DEVICE AND METHOD OF ULTRASONIC CLEANING|ES201730981A| ES2697917B2|2017-07-26|2017-07-26|DEVICE AND METHOD OF ULTRASONIC CLEANING|
    PCT/ES2018/070527| WO2019020857A1|2017-07-26|2018-07-23|Ultrasound cleaning device and method|
    [返回顶部]